+ 0. 5 o Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 5 A Two sides polished Package: Each wafer is packed in 1000 class clean room with 100 grade"> + 0. 5 o Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 5 A Two sides polished Package: Each wafer is packed in 1000 class clean room with 100 grade"> + 0. 5 o Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 5 A Two sides polished Package: Each wafer is packed in 1000 class clean room with 100 grade"> Al2O3- Sapphire Wafer, R Plane, 10x10x1.0mm, 2SP Orientation 110 Wafer size: 2" dia x – constructoracolonial.com.ar

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Al2O3- Sapphire Wafer, R Plane, 10x10x1.0mm, 2SP Orientation 110 Wafer size: 2" dia x

$45.94

Quantity
Description

Wafer size:   2" dia x  0

up to 25mm and compatible with most of the popular coin cell size

2 sides polished

Atomic Weight:      26

Replacement blade for aluminum alloy flange (not included) with 0

Al2O3- Sapphire Wafer, R Plane, 10x10x1.0mm, 2SP Orientation 110 Wafer size: 2" dia xFeatures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties Wafer size: 10 mm x 10 mm x 1. 0 mm thick Orientation tolerance: <1 102> + 0. 5 o Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 5 A Two sides polished Package: Each wafer is packed in 1000 class clean room with 100 grade

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