LaAlO3, (111) 10x10x0.5 mm substrate, 2 sides Epi polished - LAOc101005S2 Cell Holder 12mm(T) Active Material Proportion in

12mm(T) Active Material Proportion in Powder 94

Polish:          One  side  EPI polished by CMP tecnology with less sub-surface lattice damage

Pack:    Packed in 100 grade plastic bag under 1000 class clean room

200&450 Mesh to separate the 32~75 microns particles for pressing (Pic

organic materials

LaAlO3, (111) 10x10x0.5 mm substrate, 2 sides Epi polished - LAOc101005S2 Cell Holder 12mm(T) Active Material Proportion inSubstrate Specifcations: Wafer Size: 10 x 10 x 0. 5 mm thickness + 0. 05 mm, Wafer Orientation: (111) + 0. 5 Deg Polishing: Two sides CMP polished with free sub surface damaged. Surface finish (RMS or Ra) : < 10A Package: Under 1000 class clean room, and in 100 grade plastic bag in a wafer container. Lattice Constant a=3. 792Pseudo cubic Warning: LaAlO3 crystal has a visible twin on a polished surface, which is normal nature .