MgO (100) Epi polishing wafer 1" Dia x0.5mm ,1SP - MGa25D05C1 Orientation 10-10 Size: 5x5x 0

Size: 5x5x 0

81 Li (wt%) 7

Polish: One or two  side EPI polished by CMP technology with minimum sub-surface damage

Si:C = 1:9)

Active materials Mass Proportion 96%

MgO (100) Epi polishing wafer 1" Dia x0.5mm ,1SP - MGa25D05C1 Orientation 10-10 Size: 5x5x 0Specifications of MgO Substrate Size: 1" diameter x 0. 5mm + _ 0. 05 mm Orientation: (100) + 0. 5 Deg Polish: One side EPI polished by CMP technology with minimum sub surface damage. Surface finish (RMS or Ra): < 10A Packing: The substrate is packed with 100 grade clean plastic bag under 1000 class clean room Precautions: MgO is sensitive to moisture, and must be stored in vacuum box. Warning: MgO crystal was grown by arc melting method and nature