E17600 - SEMI E176 - Guide to Assess and Minimize Electromagnetic Interference (EMI) in a Semiconductor Manufacturing Environment Revision:SEMI E176-1017 - Superseded 本試験方法の目的は，MFCに関わる取付姿勢の影響を定量化する標準方法を提供することである。

本試験方法の目的は，MFCに関わる取付姿勢の影響を定量化する標準方法を提供することである。

originally published June 2000

7-0304 (technical revision)

01 ppba and 5 ppba for each of the electrically active elements

The results of this test can be used for qualitative ranking of gas delivery system based on the design

E17600 - SEMI E176 - Guide to Assess and Minimize Electromagnetic Interference (EMI) in a Semiconductor Manufacturing Environment Revision:SEMI E176-1017 - Superseded 本試験方法の目的は，MFCに関わる取付姿勢の影響を定量化する標準方法を提供することである。1 Purpose 1. 1 The purpose of this Guide is to provide guidance for the assessment and minimization of electromagnetic interference (EMI) in a semiconductor manufacturing environment to improve yield, equipment availability, and test results (e. g., testing time, measurement relevance, repeatability, and accuracy). 2 Scope 2. 1 This Guide applies to equipment and facilities provided for the purpose of manufacturing semiconductor devices (i. e.,